It’s not a surprise that SMIC could use double patterning with older, DUV equipment to reach the 7-nm node, he said. TSMC’s first 7-nm process was done without using EUV tools, according to a former TSMC engineer who spoke with EE Times on the condition of anonymity. has banned Shanghai-based SMIC from using EUV lithography tools made only by ASML of the Netherlands.
SCHURTER Leading the Way Towards Greener Electronics Manufacturing
